Positive-type photoresist composition

Details Positive-type photoresist composition Positive-type photoresist composition

1993-12-28

1994-08-23

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430192, 430193, G03F 7023, G03F 730

Patent

active

053406869

ABSTRACT:
A positive-type photoresist composition is described as including:

REFERENCES:
patent: 3928288 (1975-12-01), Walker
patent: 4267258 (1981-05-01), Yoneda et al.
patent: 4626492 (1986-12-01), Eilbeck
patent: 4797346 (1989-01-01), Yamamoto et al.
patent: 4812551 (1989-03-01), Oi et al.
patent: 4865945 (1989-09-01), Noguchi et al.
patent: 4877859 (1989-10-01), Tamaru et al.
patent: 5019479 (1991-05-01), Oka et al.
patent: 5023311 (1991-06-01), Kubota

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