Positive type photo-sensitive siloxane composition, cured...

Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C430S191000, C430S192000, C430S193000

Reexamination Certificate

active

11272791

ABSTRACT:
A positive photosensitive siloxane composition having high photosensitivity and having such properties as high heat resistance, high transparency and low dielectric constant may be used to form a planarization film for a TFT substrate, an interlayer dielectrics or a core or cladding of an optical waveguide. The positive photosensitive siloxane composition includes a siloxane polymer, quinonediazide compound and solvent, and a cured film formed of the composition has a light transmittance per 3 μm of film thickness at a wavelength of 400 nm of 95% or more.

REFERENCES:
patent: 5158854 (1992-10-01), Imamura et al.
patent: 5389492 (1995-02-01), Kokubo et al.
patent: 5953084 (1999-09-01), Shimada et al.
patent: 6797453 (2004-09-01), Shiraki et al.
patent: 6899991 (2005-05-01), Kato et al.
patent: 6949324 (2005-09-01), Watanabe et al.
patent: 2003/0211407 (2003-11-01), Watanabe et al.
patent: 03-059667 (1991-03-01), None
patent: 07-098502 (1995-04-01), None
patent: 10-153854 (1998-06-01), None
patent: 2001-281853 (2001-10-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Positive type photo-sensitive siloxane composition, cured... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Positive type photo-sensitive siloxane composition, cured..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive type photo-sensitive siloxane composition, cured... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3935449

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.