Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1992-03-02
1993-05-18
McCamish, Marion E.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430191, 430192, G03C 152
Patent
active
052120422
ABSTRACT:
A positive type light-sensitive composition is disclosed, comprising an alkali-soluble high-molecular binder and at least one p-iminoquinonediazido-N-sulfonyl compound. This composition can be used for forming a resist for an IC board, a printing plate, a silver-free, image-forming material, etc.
REFERENCES:
patent: 2759817 (1956-08-01), Schmidt et al.
patent: 3050387 (1962-08-01), Neugebauer et al.
patent: 3050388 (1962-08-01), Neugebauer et al.
patent: 3567453 (1971-03-01), Borden
Ishige Sadao
Shinozaki Fumiaki
Umehara Akira
Dudd Kathleen
Fuji Photo Film Co. , Ltd.
McCamish Marion E.
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