Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1988-03-29
1989-09-05
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430191, 430193, 430326, G03C 160
Patent
active
048638293
ABSTRACT:
A positive type photoresist composition comprising a novolak resin and O-quinone diazide compound, the novolak resin being one which is obtained by the addition condensation reaction of a phenol and formaldehyde which is performed in one stage by using as a catalyst an organic acid salt of a divalent metal which is more electropositive than hydrogen, or in two stages by using an acid catalyst in the subsequent stage, the phenol being at least one compound represented by the formula ##STR1## wherein R is hydrogen or an alkyl group of carbon number 1 to 4, the compound being such that the average carbon number in the substituent per one phenol nucelus is 0.5 to 1.5 and the ones with the substituent at the ortho- or para-position with respect to the hydroxyl group account for less than 50 mol %, is disclosed. The positive type photoresist composition of the invention has an improved resolving power, i.e., .gamma.-value.
REFERENCES:
patent: 3634082 (1972-01-01), Christenson
patent: 3759711 (1973-09-01), Rouner et al.
patent: 4022942 (1977-05-01), Anderson et al.
patent: 4097463 (1978-06-01), Culbertson
patent: 4297473 (1981-10-01), Koshibe et al.
patent: 4299947 (1981-11-01), Nanjo et al.
patent: 4308368 (1981-12-01), Kubo et al.
patent: 4347305 (1982-08-01), Shiba et al.
patent: 4377631 (1983-03-01), Toukhy et al.
patent: 4529682 (1985-07-01), Toukhy
Kosar, J., Light-Sensitive Systems, J. Wiley & Sons, 1965, pp. 336-339, 342 and 352.
Bowder, J. et al., J. Electrochem. Soc., vol. 128, No. 6, pp. 1304, 1305, 1981.
Pampalone, T. R., Solid State Technology, 6/1984, pp. 115-120.
DeForest, W. S., Photoresist Matis and Processes, McGraw-Hill Book Co., 1975, pp. 55, 56, 134, 147-149 & 159-160.
Furuta Akihiro
Hanabata Makoto
Hiroaki Osamu
Jinno Naoyoshi
Yasui Seimei
Bowers Jr. Charles L.
Sumitomo Chemical Company Limited
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