Positive type anionic electrodeposition photo-resist composition

Details Positive type anionic electrodeposition photo-resist composition Positive type anionic electrodeposition photo-resist composition

1994-05-27

1997-04-29

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430 18, 430165, 430191, 430193, 430313, 430318, 430329, 430330, 2041816, 2041817, G03F 7023, G03F 738, G03F 740, C25D 1300

Patent

active

056247818

ABSTRACT:
A positive type anionic electrodeposition photoresist composition comprising, as a main component, a dispersion obtained by neutralizing, with a base, a mixture comprising:
(A) an acrylic resin containing carboxyl group(s) and hydroxyl group(s),
(B) a vinylphenol resin containing a hydroxystyrene unit in an amount of at least 25% by weight based on the resin, and
(C) an ester between a polyhydroxybenzophenone and 1,2-naphthoquinone diazide sulfonic acid or benzoquinone diazide sulfonic acid, and dispersing the resulting neutralization product in water.
This composition is superior in running stability during electrodeposition and is useful for formation of highly reliable resist pattern or conductor pattern.

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