Radiation imagery chemistry: process – composition – or product th – Electric or magnetic imagery – e.g. – xerography,... – Post imaging process – finishing – or perfecting composition...
Patent
1988-12-23
1990-05-15
Michl, Paul R.
Radiation imagery chemistry: process, composition, or product th
Electric or magnetic imagery, e.g., xerography,...
Post imaging process, finishing, or perfecting composition...
430106, 430904, G03G 908, G03G 910
Patent
active
049257641
ABSTRACT:
Positively chargeable toner containing block copolymers for electrostatic reprography, giving improved compatibility with the toner resin. Preferred are block copolymers of styrene with methyl methacrylate and butyl methacrylate as one block and dimethylaminoethyl methacrylate as the other block, quaternized with methyl tosylate or benzyl chloride.
REFERENCES:
patent: 3893935 (1975-07-01), Jadwin et al.
patent: 4134760 (1979-01-01), Gibson et al.
patent: 4299898 (1981-11-01), Williams et al.
patent: 4355167 (1982-10-01), Ciccarelli
patent: 4371601 (1983-02-01), Ciccarelli
patent: 4378419 (1983-03-01), Ciccarelli
patent: 4414372 (1983-11-01), Farnham et al.
patent: 4417034 (1983-11-01), Webster
patent: 4508880 (1985-04-01), Webster
patent: 4524196 (1985-06-01), Farnham et al.
patent: 4568624 (1986-02-01), Ohshima et al.
patent: 4581312 (1986-04-01), Nakahara et al.
patent: 4588795 (1986-05-01), Dicker et al.
patent: 4621039 (1986-11-01), Ciccarelli et al.
patent: 4656226 (1987-04-01), Hutchins et al.
patent: 4755563 (1988-07-01), West
patent: 4840863 (1989-06-01), Otsu et al.
Grezzo Page Loretta A.
Madeleine Dennis G.
Senkler Carol A.
Burgess Richard H.
E. I. Du Pont de Nemours & Co.
Lindeman Jeffrey A.
Michl Paul R.
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