Positive resists containing dimethylglutarimide units

Details Positive resists containing dimethylglutarimide units Positive resists containing dimethylglutarimide units

1975-09-22

1976-06-22

Herbert, Jr., Thomas J.

Gas separation: apparatus

Electric field separation apparatus

Electrode cleaner, apparatus part flusher, discharger, or...

96115R, 20415911, 20415916, 427 43, G03C 500, G03C 524

Patent

active

039649083

ABSTRACT:
A process for forming an image with a positive resist using a polymer containing dimethylglutarimide units. The polymer is sensitive to both electron beam and light radiation, has a high glass transition temperature, a high temperature resistance, and is capable of very fine spatial resolution, very suitable for micro circuitry processings.

REFERENCES:
patent: 3535137 (1970-10-01), Haller et al.
patent: 3887450 (1975-06-01), Gilano et al.
patent: 3898350 (1975-08-01), Gipstein et al.
patent: 3920618 (1975-11-01), Ichimura et al.
Chem. Abst., vol. 56, Mar. 1962, p. 6186(d).
Chem. Abstracts, vol. 65, 1966, p. 10680(d).

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