Positive resist medium and method of employing same

Details Positive resist medium and method of employing same Positive resist medium and method of employing same

1979-11-23

1981-04-14

Louie, Jr., Won H.

Radiation imagery chemistry: process, composition, or product th

Imaged product

Including resin or synthetic polymer

430326, 430281, 430286, 430296, 430942, 430905, 430966, 430967, 20415914, G03C 500

Patent

active

042620732

ABSTRACT:
A recording medium is provided which is comprised of a substrate and a film of a polyacetylene sulfone on the surface of the substrate. The recording medium is especially useful in the microlithographic manufacture of electronic circuits using deep ultraviolet exposure.

REFERENCES:
patent: 3893127 (1975-07-01), Kaplan et al.
patent: 3898350 (1975-08-01), Gipstein et al.
patent: 3916036 (1975-10-01), Gipstein et al.
patent: 3935331 (1976-01-01), Poliniak et al.
patent: 3935332 (1976-01-01), Poliniak et al.
patent: 4054454 (1977-10-01), Himics et al.
"Acetylene Polysulfones" by C. S. Marvel and W. W. Williams, Journal of American Chemical Society, vol. 61, Oct. 1939, pp. 2710-2714.
"Polysulfones From Acetylenes and Sulfur Dioxide" by L. L. Ryden and C. S. Marvel, Journal of American Chem. Soc., vol. 58, Oct. 1936, pp. 2047-2050.

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