Positive resist for electron beam and x-ray lithography and meth

Details Positive resist for electron beam and x-ray lithography and meth Positive resist for electron beam and x-ray lithography and meth

1980-11-14

1982-05-18

Marquis, Melvyn I.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

From sulfur-containing reactant

430296, 427 36, 427 431, 427273, 428199, 528391, C08G 7500

Patent

active

043306713

ABSTRACT:
Copolymers of an aziridine and sulfur dioxide are disclosed which are useful as positive radiation resists for use in electron beam and x-ray lithography.

REFERENCES:
patent: 3893127 (1975-07-01), Kaplan et al.
patent: 3920392 (1975-11-01), Harada et al.
patent: 4061829 (1977-12-01), Taylor
patent: 4262083 (1981-04-01), Pampalone et al.

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