Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1982-02-10
1983-08-09
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430193, 430326, 260141, G03C 154, G03C 160
Patent
active
043979378
ABSTRACT:
Positive resists are formed from a soluble phenolic resin and a sensitizer which is a diester of a 1-oxo-2-diazonaphthalene sulfonic acid and of an unsymmetrical primary or secondary aliphatic diol which is a mixture of geometric and diastereoisomers.
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patent: 4308368 (1981-12-01), Kubo et al.
Grant, Julius, "Hockh's Chemical Dictionary", 4th Ed., 1969, pp. 295, 296, 361 and 637.
Gilman, Henry, "Organic Chemistry", 2nd Ed., 1953, pp. 229 and 244-245.
Clecak Nicholas J.
McKean Dennis R.
Miller Robert D.
Tompkins Terry C.
Twieg Robert J.
Bowers Jr. Charles L.
International Business Machines - Corporation
Walsh Joseph G.
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