Positive resist composition containing quinone diazide sulfonate

Details Positive resist composition containing quinone diazide sulfonate Positive resist composition containing quinone diazide sulfonate

1990-09-25

1992-11-24

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430190, 430193, G03F 7023

Patent

active

051660334

ABSTRACT:
Disclosed herein is a positive resist composition comprising an alkali-soluble phenolic resin and the quinonediazide sulfonate of at least one phenolic compound selected from vinylphenol compounds and isopropenylphenol compounds as a photosensitive agent. It is suitable for use in minute processing.

REFERENCES:
patent: 4139384 (1979-02-01), Iwasaki et al.
patent: 4358522 (1982-11-01), Fujita et al.
patent: 4696886 (1987-09-01), Hanabata et al.
patent: 4828958 (1989-05-01), Hayase et al.
patent: 4840869 (1989-06-01), Kita et al.
patent: 4871644 (1989-10-01), Bauer
Gentaro Nagamatsu and Hideo Inui, "Photosensitive Polymers", Kadamasha, Tokyo (1980) (English Translations).

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