Positive resist composition containing alkali-soluble phenolic r

Details Positive resist composition containing alkali-soluble phenolic r Positive resist composition containing alkali-soluble phenolic r

1990-10-26

1992-05-12

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430190, 430192, 430193, G03F 7023, G03C 161

Patent

active

051127199

ABSTRACT:
Disclosed herein is a positive resist composition comprising an alkali-soluble phenolic resin, a photosensitive agent formed of a quinonediazide sulfonic acid ester and at least one compound represented by the following general formula (I): ##STR1## wherein R.sup.1 through R.sup.6 mean individually a hydrogen or halogen atom, a hydroxyl group or an alkyl or alkenyl group having 1-4 carbon atoms and may be equal to or different from one another,

REFERENCES:
patent: 3188210 (1965-06-01), Fritz et al.
patent: 4115128 (1978-09-01), Kita
patent: 4365019 (1982-12-01), Daly et al.
patent: 4626492 (1986-12-01), Eilbeck
patent: 4983492 (1991-01-01), Trefonas, III et al.
Yamjima, Patent Abstracts of Japan, vol. 13, No. 75 (P-831) (3423) published Feb. 21, 1989.

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