Radiation imagery chemistry: process – composition – or product th – Plural exposure steps
Reexamination Certificate
2006-04-26
2010-10-19
Walke, Amanda C. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Plural exposure steps
C430S270100, C430S905000, C430S913000
Reexamination Certificate
active
07816072
ABSTRACT:
A positive resist composition for producing MEMS using an electron beam, the composition comprising a resin component (A) that displays increased alkali solubility under the action of acid, and an acid generator component (B) that generates acid upon irradiation, wherein the resin component (A) is a resin prepared by protecting a portion of all the hydroxyl groups within an alkali-soluble novolak resin with acid-dissociable, dissolution-inhibiting groups.
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Machine translation of JP 2005-10215 (no date).
Machine translation of JP 2004-354609 (no date).
Machine translation JP 2005-070153 (no date).
International Search Report from PCT/JP2006/308692, mailed Jul. 18, 2006.
Knobbe Martens Olson & Bear LLP
Tokyo Ohka Kogyo Co. Ltd.
Walke Amanda C.
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