Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1992-03-18
1995-07-25
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430193, 534557, G03F 7023, G03F 730
Patent
active
054361079
ABSTRACT:
A positive resist composition which comprises, in admixture, an alkali-soluble resin; at least one quinone diazide sulfonate of a polyhydric phenol compound of the formula: ##STR1## wherein R.sub.1 to R.sub.5 are independently a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group, provided that at least one of R.sub.1 and R.sub.2 is an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group; and
REFERENCES:
patent: 5059507 (1991-10-01), Uetani et al.
Hanawa Ryotaro
Ida Ayako
Nakanishi Hirotoshi
Tomioka Jun
Uetani Yasunori
Bowers Jr. Charles L.
Chu John S.
Sumitomo Chemical Company Limited
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