Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1997-09-19
2000-05-30
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430192, 430193, 430920, 430926, G03F 7023
Patent
active
060689625
ABSTRACT:
A non-chemically enhanced type positive resist composition includes an alkali-soluble novolak resin, a quinonediazide type sensitizer and at least one of the following compounds (a) and (b):
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Moriuma Hiroshi
Tomioka Jun
Uetani Yasunori
Chu John S.
Sumitomo Chemical Company Limited
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