Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1997-10-15
1999-06-29
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
4302701, 430905, G03F 7004
Patent
active
059167289
ABSTRACT:
A positive photo resist composition of chemical amplifying type, which is excellent in various properties such as sensitivity resolution, heat resistance, film retention ratio, applicability and profile and also excellent in time delay effect resistance, and which comprises
REFERENCES:
patent: 5320931 (1994-06-01), Umehara et al.
patent: 5403695 (1995-04-01), Hayase et al.
patent: 5658706 (1997-08-01), Niki et al.
Fukui Nobuhito
Takagaki Hiroshi
Takahashi Kenji
Yako Yuko
Chu John S.
Sumitomo Chemical Company Limited
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