Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1992-10-14
1994-01-04
McCamish, Marion E.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430192, 430193, 430270, 430326, 430909, 522 27, G03F 7022
Patent
active
052759105
ABSTRACT:
A positive radiation-sensitive resist composition comprising an alkali-soluble resin, a radiation-sensitive ingredient and a phenol compound represented by the general formula (I): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 independently of one another each represent a hydrogen atom, an alkyl group or an alkoxy group and n represents 1, 2 or 3.
REFERENCES:
patent: 5130225 (1992-07-01), Uetani
Abstract of Japanese Patent 3-191351.
European Search Report Dec. 22, 1992.
Moriuma Hiroshi
Nakanishi Hirotoshi
Uetani Yasunori
Dote Janis L.
McCamish Marion E.
Sumitomo Chemical Company Limited
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