Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1993-12-06
1994-08-09
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430192, 430193, G03F 7023, G03C 161
Patent
active
053365836
ABSTRACT:
A positive resist composition containing, in admixture, an alkali-soluble resin, a quinone diazide compound and a mixed solvent of ethyl lactate and at least one solvent selected from the group consisting of (a) n-amyl acetate and (b) 2-heptanone in a weight ratio of 5:95 to 80:20, which composition has a good coating properties and provides an improved profile and a large depth of focus.
REFERENCES:
patent: 4983492 (1991-01-01), Trefonas, III et al.
patent: 5128230 (1992-07-01), Templeton et al.
patent: 5215857 (1993-06-01), Hosaka et al.
Doi Yasunori
Hanawa Ryotaro
Hashimoto Kazuhiko
Osaki Haruyoshi
Uetani Yasunori
Bowers Jr. Charles L.
Sumitomo Chemical Company Limited
Young Christopher G.
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