Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1992-04-22
1994-12-27
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430192, G03F 7023
Patent
active
053764978
ABSTRACT:
Disclosed herein is a positive resist composition comprising in admixture:
REFERENCES:
patent: 4931381 (1990-06-01), Spak et al.
patent: 4985333 (1991-01-01), Tokutake et al.
patent: 5112719 (1992-05-01), Yamada et al.
Fujii Toshiaki
Ikeda Shinya
Kashiwagi Motofumi
Kawata Shoji
Koito Kazuko
Bowers Jr. Charles L.
Nippon Zeon Co. Ltd.
Young Christopher G.
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