Positive polymeric electron beam resists of very great sensitivi

Details Positive polymeric electron beam resists of very great sensitivi Positive polymeric electron beam resists of very great sensitivi

1974-03-25

1976-12-07

Newsome, John H.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

96 351, 96 362, 96115R, 427273, B05D 306

Patent

active

039963934

ABSTRACT:
It has been discovered that the sensitivity of positive acting polymeric electron beam resists is increased by well over an order of magnitude by using polymers having a molecular weight of at least one million, thereby making it possible to reduce the required radiation to below 3 .times. 10.sup..sup.-6 coulombs/cm.sup.2.

REFERENCES:
patent: 3535137 (1970-10-01), Haller et al.
patent: 3779806 (1973-12-01), Gipstein et al.
patent: 3932352 (1976-01-01), Freedman et al.
Bowden et al. "Journal of Applied Polymer Science" vol. 17 pp. 3211-3221 Oct. 1973.

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