Radiation imagery chemistry: process – composition – or product th – Imaged product – Including resin or synthetic polymer
Patent
1997-05-16
1999-01-12
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Imaged product
Including resin or synthetic polymer
430192, 430193, 430326, 430330, G03F 7023
Patent
active
058585842
ABSTRACT:
A highly reliable positive type photosensitive resin composition composed of diamine having a carboxyl group as a structural unit, which can be developed with an alkaline aqueous solution, comprising polyamic acid ester having hydrophobic group, o-quinonediazidesulfonyl amide compound, and/or o-quinonediazidesulfonyl amide sulfonic ester compound, and electronic devices using the same. A polyamide film having preferable positive type relief patterns, of which the unexposed portion is not corroded, can be obtained.
REFERENCES:
patent: 4774171 (1988-09-01), Zahn et al.
patent: 5441845 (1995-08-01), Okinoshima et al.
patent: 5518864 (1996-05-01), Oba et al.
patent: 5573886 (1996-11-01), Kato et al.
Ishida Mina
Maekawa Yasunari
Miwa Takao
Okabe Yoshiaki
Rames-Langlade Geraldine
Chu John S.
Hitachi , Ltd.
Hitachi Chemical Co. Ltd.
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