Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Reexamination Certificate
2008-05-13
2008-05-13
Chu, John S. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
C430S192000, C430S193000, C430S270100, C430S280100
Reexamination Certificate
active
07371500
ABSTRACT:
Positive photosensitive insulating resin compositions of the invention contain at least (A) an alkali soluble resin having a phenolic hydroxyl group, (B) a compound having a quinonediazido group, (C) crosslinked fine particles, (D) a compound containing at least two alkyletherified amino groups in the molecule, and (F) a solvent The resin compositions have excellent resolution, electrical insulating properties and thermal shock properties. Cured products of the invention are obtained by curing these resin compositions, and they show good adhesive properties.
REFERENCES:
patent: 4873176 (1989-10-01), Fisher
patent: 5432039 (1995-07-01), Shimokawa et al.
patent: 5691101 (1997-11-01), Ushirogouchi et al.
patent: 6190833 (2001-02-01), Shiota et al.
patent: 6340552 (2002-01-01), Kihara et al.
patent: 6653043 (2003-11-01), Hanabata
patent: 7015256 (2006-03-01), Ito et al.
patent: 2004/0094752 (2004-05-01), Ito et al.
patent: 2004/0110084 (2004-06-01), Inomata et al.
patent: 859282 (1998-08-01), None
patent: 933681 (1999-08-01), None
patent: 2001-5175 (2001-01-01), None
patent: 6-201901 (1994-07-01), None
patent: 2001-240757 (2001-09-01), None
patent: 2002-258479 (2002-09-01), None
Inomata Katsumi
Itou Atsushi
Iwanaga Shin-ichirou
Nishioka Takashi
Suzuki Masayoshi
Chu John S.
JSR Corporation
Oblon & Spivak, McClelland, Maier & Neustadt P.C.
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