Positive photosensitive compositions with 1,2-naphthoquinone dia

Details Positive photosensitive compositions with 1,2-naphthoquinone dia Positive photosensitive compositions with 1,2-naphthoquinone dia

1986-10-06

1988-02-16

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430323, 430326, 528129, 528153, G03C 160

Patent

active

047255234

ABSTRACT:
Disclosed herein is a positive photosensitive composition comprising a 1,2-naphthoquinone diazide compound and a binder resin comprising a novolak resin containing as condensation components .beta.-naphthol, or .alpha.-naphthol and p-cresol.

REFERENCES:
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patent: 3868254 (1975-02-01), Wemmers
patent: 4173470 (1979-11-01), Fahrenholtz et al.
patent: 4250242 (1981-02-01), Doering
patent: 4308368 (1981-12-01), Kubo et al.
patent: 4377631 (1983-03-01), Toukhy et al.
patent: 4404357 (1983-09-01), Taylor et al.
patent: 4424315 (1984-01-01), Taylor et al.
patent: 4439516 (1984-03-01), Cernigliaro et al.
patent: 4551409 (1985-11-01), Gulla et al.

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