Organic compounds -- part of the class 532-570 series – Organic compounds – Sulfur containing
Reexamination Certificate
2006-08-30
2010-10-12
Hamilton, Cynthia (Department: 1795)
Organic compounds -- part of the class 532-570 series
Organic compounds
Sulfur containing
C568S029000, C568S035000, C522S049000, C522S050000, C522S059000, C430S270100, C430S914000, C430S921000, C430S925000
Reexamination Certificate
active
07812194
ABSTRACT:
A positive photosensitive composition comprises a compound capable of generating a specified sulfonic acid upon irradiation with one of an actinic ray and radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer.
REFERENCES:
patent: 5498820 (1996-03-01), Hommeltoft
patent: 5824824 (1998-10-01), Osawa et al.
patent: 6306555 (2001-10-01), Schulz et al.
patent: 6692897 (2004-02-01), Fujimori et al.
patent: 6749987 (2004-06-01), Kodama et al.
patent: 6783927 (2004-08-01), Yoshioka
patent: 6849374 (2005-02-01), Cameron et al.
patent: 6855476 (2005-02-01), Ferreira et al.
patent: 6908722 (2005-06-01), Ebata et al.
patent: 2001/0044072 (2001-11-01), Trefonas
patent: 2002/0197558 (2002-12-01), Ferreira et al.
patent: 295 421 (1991-10-01), None
patent: 0 693 468 (1996-01-01), None
patent: 1 033 624 (2000-09-01), None
patent: 1 041 442 (2000-10-01), None
patent: 55106453 (1980-08-01), None
patent: 9-12537 (1997-01-01), None
patent: 10-007650 (1998-01-01), None
patent: 10010715 (1998-01-01), None
patent: 2000-275845 (2000-10-01), None
patent: 2001-133967 (2001-05-01), None
patent: WO 00/08525 (2000-02-01), None
Houlihan et al, Chem. Mater. year 2000, web published date Oct. 28, 2000, vol. 12, pp. 3516-3524, American Chemical Society.
English translation of JP, 2001-133967, A (2001) from machine translation from AIPN Japan Patent Office National center for Industrial Property Information and Training, generated Jul. 9, 2008, 10 pages.
King et al J. ORg. Chem 1996, No Month Given, vol. 61, pp. 7250-7255, American Chemical Society.
Lee et al, Journal of Photopolymer Science and Technology, vol. 13, No. 2 (2000) pp. 215-216. No month given.
AN 2000:579488, Caplus File, Copyrignt 2008 ACS on STN 2 pages Entered: Aug. 23, 2000 abstract of Lee article from Journal of Photopolymer Science and Technology (2000), 13(2), 215-216.
English translation of JP 10-007650, A (1998) from machine translation from AIPN Japan Patent Office National center for Industrial Property Information and Training, generated May 14, 2008, 24 pages.
Research Disclosure No. 337007 published May 1992, 2 pages., Kenneth Mason Publications Ltd.
CA 94:130305 for JP 55106453, Aug. 1980.
CA 69:95876, 1968, no month.
CA 68:12389, 1967, no month.
CA 55:13179, 1960, no month.
XP-002188319—Abstract of JP 08/027094 Jan. 30, 1996.
Eropean Search Report dated Feb. 11, 2002.
CA 116:245286 abstract of DD 295421, Oct. 31, 1991.
CA 128:161008 abstract of JP 10010715, Jan. 16, 1998.
A Japanese Office Action dated Apr. 9, 2008.
A Japanese Office Action dated Apr. 16, 2008.
Aoai Toshiaki
Kodama Kunihiko
FUJIFILM Corporation
Hamilton Cynthia
Sughrue & Mion, PLLC
LandOfFree
Positive photosensitive composition does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Positive photosensitive composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive photosensitive composition will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4233440