Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Reexamination Certificate
2007-05-08
2007-05-08
Chu, John S. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
C430S270100, C430S905000, C430S910000, C430S921000, C430S922000
Reexamination Certificate
active
10338737
ABSTRACT:
A positive photosensitive composition comprising (A1) a compound that generates an aromatic sulfonic acid substituted with at least one fluorine atom and/or a group having at least one fluorine atom upon irradiation of an actinic ray or radiation, (B) a resin that has a monocyclic or polycyclic alicyclic hydrocarbon structure and is decomposed by the action of an acid to increase solubility in an alkali developing solution, and (C) a compound that has at least three hydroxy or substituted hydroxy groups and at least one cyclic structure or (A2) an onium salt of an alkanesulfonic acid in which the α-position of the sulfonic acid is not substituted with a fluorine atom and/or an onium salt of a carboxylic acid.
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JP Office Action based on JP 2002-003899 dated Apr. 12, 2006.
JP Office Action based on JP 2002-003900 dated Apr. 12, 2006.
Fujimori Toru
Kawabe Yasumasa
Kodama Kunihiko
Nakao Hajime
Chu John S.
Fujifilm Corporation
Sughrue & Mion, PLLC
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