Positive photoresists with enhanced resolution and reduced cryst

Details Positive photoresists with enhanced resolution and reduced cryst Positive photoresists with enhanced resolution and reduced cryst

1994-01-11

1995-07-25

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaged product

Nonsilver image

430 18, 430165, 430300, 430311, 430326, G03F 7023

Patent

active

054360986

ABSTRACT:
Positive photoresist compositions comprising, in an organic solvent, at least

REFERENCES:
patent: 2965611 (1960-12-01), Schwarzer
patent: 3046112 (1962-07-01), Schmidt et al.
patent: 3106462 (1963-10-01), Cottle
patent: 3148983 (1964-09-01), Endermann et al.
patent: 3201239 (1965-08-01), Neugebauer et al.
patent: 3365019 (1968-01-01), Bays
patent: 3661582 (1972-05-01), Broyde
patent: 4036644 (1977-07-01), Kaplan et al.
patent: 4115128 (1978-09-01), Kita
patent: 4277600 (1981-07-01), Mark et al.
patent: 4552876 (1985-11-01), Jones et al.
patent: 4626492 (1986-12-01), Eilbeck
patent: 5077173 (1991-12-01), Schulz et al.
patent: 5296330 (1994-03-01), Schulz et al.
Chem. Ber. 52 (1979) pp. 2077-2079.
Patent Abstract of Japan vol. 9, 276 60-121445 Nov. 1985.
Derwent Abstr. 90-309568/41 of JP 2219812-A (Sep. 1990).

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