Positive photoresists containing preformed polyglutarimide polym

Details Positive photoresists containing preformed polyglutarimide polym Positive photoresists containing preformed polyglutarimide polym

1983-11-21

1985-06-18

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430156, 430192, 430270, 430313, 430326, G03C 154, G03C 168, G03C 500

Patent

active

045241210

ABSTRACT:
This invention relates to a positive photoresist system possessing a high degree of thermal stability. The photoresist system contains a preformed polyglutarimide polymer dissolved in a non-reacting solvent. The positive resist is capable of achieving high resolution images by exposure to a wide range of wavelengths and development using an aqueous base developer. The photoresist system is also suitable for use as a planarizing layer in a multiple layer system.

REFERENCES:
patent: 3964908 (1976-06-01), Bargon et al.
patent: 4079041 (1978-03-01), Baumann et al.
patent: 4121936 (1978-10-01), Matsuda et al.
patent: 4246374 (1981-01-01), Kopchik
patent: 4254232 (1981-03-01), Mueller
patent: 4379874 (1983-04-01), Stoy

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