Positive photoresists comprising a novolak resin made from 2,3-d

Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

430165, 430191, 430193, 528155, G03F 7023, G03F 730

Patent

active

053227573

ABSTRACT:
Improved photoresist compositions having high resolution and high thermal resistance, produced from certain novolak polymers and diazoquinone photosensitizers. The useful novolak polymers are formed from phenolic mixtures including 2,3,5-trimethyl phenol and/or 2,3-dimethyl phenol, and optional amounts of 2,6-dimethyl phenol, o-cresol and p-cresol.

REFERENCES:
patent: 4173290 (1979-11-01), Kobayashi et al.
patent: 4404357 (1983-09-01), Taylor et al.
patent: 4451550 (1984-05-01), Bennett et al.
patent: 4529682 (1985-07-01), Toukhy
patent: 4719167 (1988-01-01), Miura et al.
patent: 4725523 (1988-02-01), Miura et al.
patent: 5059507 (1991-10-01), Uetani et al.
patent: 5124228 (1992-06-01), Uetani et al.
Solid State Technology, Jun. 1984, pp. 115-120, T. R. Pampalone "Novolac Resins Used in Positive Resist Systems".
Chen and Rice "Study of Dryout Resistance of Phenolic Copolymer Resins for Pine Plywood Glues--Parts I & II" Forest Products Journal vol. 24, No. 3.
Solid State Technology, Jun. 1984, pp. 115-120, T. R. Pampalone "Novolac Resins Used in Positive Resist Systems".
English language abstract of Japanese Publication #62-163,055, Published Jul. 18, 1987 (Mitsubishi Chem.).
English language abstract of Japanese Publication #62-89,040, dated Apr. 23, 1987.
Rice et al., "Study of Dryout Resistance of Phenolic Copolymer Resins for Pine Plywood Glues--Parts I and II", Forest Products Journal, Mar., 1974.
English language abstract of Japanese Publication #60-164,740, Published Aug. 27, 1985, (Hosaka et al.).
English language abstract of Japanese Publication #60-176,034 Published Sep. 10, 1985, (Hosaka et al.).
English language abstract of Japanese Publication #55-126,250, Published Sep. 29, 1980, (Fuji Photo Film).
English language abstract of Japanese Publication #158,440, Published Aug. 19, 1985, (Mitsubishi Chem. Ind. K.K.).
English language abstract of Europe Publication #136,110, Published Apr. 3, 1985 (Miura et al.).
English language abstract of Japanese Publication #62-89,040, Published Apr. 23, 1987, (Miura et al.).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Positive photoresists comprising a novolak resin made from 2,3-d does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Positive photoresists comprising a novolak resin made from 2,3-d, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive photoresists comprising a novolak resin made from 2,3-d will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2219975

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.