Positive photoresists comprising a novolak resin made from 2,3-d

Details Positive photoresists comprising a novolak resin made from 2,3-d Positive photoresists comprising a novolak resin made from 2,3-d

1993-03-24

1994-06-21

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430191, 430193, 528155, G03F 7023, G03F 730

Patent

active

053227573

ABSTRACT:
Improved photoresist compositions having high resolution and high thermal resistance, produced from certain novolak polymers and diazoquinone photosensitizers. The useful novolak polymers are formed from phenolic mixtures including 2,3,5-trimethyl phenol and/or 2,3-dimethyl phenol, and optional amounts of 2,6-dimethyl phenol, o-cresol and p-cresol.

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