Positive photoresist having improved processing properties

Details Positive photoresist having improved processing properties Positive photoresist having improved processing properties

1993-12-03

1994-11-29

Schofer, Joseph L.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

C08F 2240

Patent

active

053692004

ABSTRACT:
Polymers having a molecular weight (weight average) M.sub.w from 10.sup.3 to 10.sup.6, comprising recurring structural units of the formulae (I), (IIa) and (IIb) ##STR1## in which R.sub.1 is hydrogen or methyl, Y is a direct bond or a divalent radical of the formula (III) ##STR2## in which Z is a C.sub.1 -C.sub.6 alkylene group bound to the phenyl nucleus,

REFERENCES:
patent: 3423367 (1969-01-01), Clark et al.
patent: 4491628 (1985-01-01), Ito et al.
patent: 4604438 (1986-08-01), Beuhler et al.
patent: 4629773 (1986-12-01), Muller
patent: 5069987 (1991-12-01), Schwalm et al.
patent: 5118585 (1992-06-01), Schwalm et al.
Macromolecules, 1989, 22, 21-25 "Photocopolymerizations of Electron-Rich Olefins with Electron-Poor Olefins . . ".
"Synthesis and Polymerization of N-(Tert-Butyloxycarbenyl) Maleimide-" Kwang et al Feb. 28, 1992.
CA vol. 115, 1991-115:170717z "Negative Chemical Amplification Resist Systems Based on Poly(Hydroxystyrenes) and N-Substituted Imides or Aldehydes".

Affiliated with

Also associated with

Rating

Positive photoresist having improved processing properties does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Positive photoresist having improved processing properties, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive photoresist having improved processing properties will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-75008