Positive photoresist containing 2,3,4-trihydroxybenzophenone and

Details Positive photoresist containing 2,3,4-trihydroxybenzophenone and Positive photoresist containing 2,3,4-trihydroxybenzophenone and

1991-01-30

1991-12-31

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430192, 430193, G03C 152

Patent

active

050771736

ABSTRACT:
Structures of high resolution in the near UV range and of high sharpness of edge and steepness of edge can be obtained by means of positive photoresists containing, in an organic solvent, in each case essentially at least

REFERENCES:
patent: 3130047 (1964-04-01), Uhlig et al.
patent: 4587196 (1986-05-01), Toukhy
patent: 4594306 (1986-06-01), Stahlhofen et al.
patent: 4626492 (1986-12-01), Eilbeck
patent: 4738915 (1988-04-01), Komine et al.

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