Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Reexamination Certificate
2006-08-15
2006-08-15
Chu, John S. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
C430S193000, C430S270100, C430S326000, C430S905000, C430S906000
Reexamination Certificate
active
07090958
ABSTRACT:
Novel compositions comprising photoactive polymers comprising a dinitrobenzyl group in conjunction with a photoacid generator are disclosed. In one embodiment, the photoacid generator is a diazide and/or a sulfonyl aceto carbonyl compound. The photoacid generators are typically used in amounts of 10 weight percent or less. The compositions find particular application in storage stable, pH stable, and water stable positive photoresist compositions. Such compositions demonstrate reduced process time as compared with similar compositions lacking the photoacid generator. Methods for using these compositions are also disclosed.
REFERENCES:
patent: 3046110 (1962-07-01), Schmidt
patent: 3106465 (1963-10-01), Neugebauer et al.
patent: 3148983 (1964-09-01), Endermann et al.
patent: 3180733 (1965-04-01), Neugebauer et al.
patent: 3188210 (1965-06-01), Fritz et al.
patent: 3849137 (1974-11-01), Barzynski et al.
patent: 3991033 (1976-11-01), Sam
patent: 4366224 (1982-12-01), Hsieh
patent: 4456679 (1984-06-01), Leyrer et al.
patent: 4632900 (1986-12-01), Demmer et al.
patent: 5064746 (1991-11-01), Schwalm
patent: 5230984 (1993-07-01), Tachiki et al.
patent: 5232815 (1993-08-01), Browne et al.
patent: 5324620 (1994-06-01), Ebersole
patent: 5508141 (1996-04-01), Hart et al.
patent: 5600035 (1997-02-01), Kahle et al.
patent: 5707777 (1998-01-01), Aoai et al.
patent: 5733479 (1998-03-01), Kahle et al.
patent: 5847218 (1998-12-01), Ohsawa et al.
patent: 5851727 (1998-12-01), Choi et al.
patent: 6100008 (2000-08-01), McMurdie
patent: 6136504 (2000-10-01), Tan et al.
patent: 6376152 (2002-04-01), Kawabe et al.
patent: 6506535 (2003-01-01), Mizutani et al.
patent: 6528229 (2003-03-01), Sato
patent: 6528232 (2003-03-01), Maeda et al.
patent: 2001/0041299 (2001-11-01), Fujita et al.
patent: 62069263 (1987-03-01), None
patent: 06003828 (1994-01-01), None
patent: 2001154354 (2001-06-01), None
patent: 2001261825 (2001-09-01), None
Ambrose Ronald R.
Campbell Randal L.
Diehl David A.
Gruber Gerald W.
Jones James E.
Chu John S.
Meyers Diane R.
Meyers Donald R.
Palladino Donald R.
PPG Industries Ohio Inc.
LandOfFree
Positive photoresist compositions having enhanced processing... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Positive photoresist compositions having enhanced processing..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive photoresist compositions having enhanced processing... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3697491