Positive photoresist compositions containing base polymer which

Details Positive photoresist compositions containing base polymer which Positive photoresist compositions containing base polymer which

1991-10-29

1994-04-12

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430190, 430192, G03F 7023, G03C 161

Patent

active

053024893

ABSTRACT:
A positive working photoresist composition based on a polyimide or polyimide precursor, a photoactivatable acid generator, and an additive compound, preferably an aromatic silanol, capable of promoting dissolution of the photoactivated portion of the resist, while it has no effect on the rest portion of the resist. Also, a method of patterning the photoresist composition.

REFERENCES:
patent: 4009033 (1977-02-01), Bakos et al
patent: 4626492 (1986-12-01), Eilbeck
patent: 4650745 (1987-03-01), Eibeck
patent: 4738915 (1988-04-01), Komine et al.
patent: 4745045 (1988-05-01), Fredericks et al.
patent: 4863828 (1989-09-01), Kawabe et al.
patent: 4880722 (1989-11-01), Moreau et al.
patent: 5024922 (1991-06-01), Moss et al.
patent: 5104768 (1992-04-01), Sassmannshausen et al.

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