Positive photoresist compositions and multilayer resist material

Details Positive photoresist compositions and multilayer resist material Positive photoresist compositions and multilayer resist material

1996-05-23

1998-03-17

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430190, 430191, 430193, G03F 7023

Patent

active

057285047

ABSTRACT:
A positive photoresist composition comprising (A) an alkali-soluble resin and (B) a light-sensitive component comprising at least one compound represented by the following general formula (I): ##STR1## where R.sup.1, R.sup.2 and R.sup.3 are each independently a hydrogen atom, an alkyl group having 1-3 carbon atoms or an alkoxy group having 1-3 carbon atoms; R.sup.4 is a hydrogen atom or an alkyl group having 1-3 carbon atoms; a, b and c are an integer of 1-3; l, m and n are an integer of 1-3, in which at least part of the hydroxyl groups present are esterified with a quinonediazidosulfonic acid and a sulfonic acid which has a group represented by the following formula (II):

REFERENCES:
patent: 4732836 (1988-03-01), Potvin et al.
patent: 4732837 (1988-03-01), Potvin et al.
patent: 4910122 (1990-03-01), Arnold et al.
patent: 5035976 (1991-07-01), Potvin et al.
patent: 5162510 (1992-11-01), Potvin et al.
patent: 5401605 (1995-03-01), Doi et al.
patent: 5429905 (1995-07-01), Tan et al.
patent: 5501936 (1996-03-01), Hosoda et al.

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