Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1992-06-19
1993-01-12
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430191, 430192, 430193, 430326, 534557, G03F 723, G03F 732
Patent
active
051789868
ABSTRACT:
A radiation sensitive oligomeric compound is described as the photoactive component with a base soluble phenolic matrix resin to provide improved photo-resist composition having high light-sensitivity, high resolution, excellent developer resistance and excellent resistance to thermal flow.
REFERENCES:
patent: 4587196 (1986-05-01), Toukhy
patent: 4642282 (1987-02-01), Stahlhofen
patent: 4837121 (1989-06-01), Blakeney et al.
English Translation of Japanese Publication #62-10,646, Published Jan. 19, 1987 (Kanto).
Partial English Translation of Japanese Publication #62-10,646, Published Jan. 19, 1987 (Kanto).
English Abstract of Japanese Publication #62-10, 646, Published Jan. 19,1987 (Kanto).
Madoux David C.
Szmanda Charles R.
Trefonas, III Peter
Zampini Anthony
Bowers Jr. Charles L.
Chu John S.
Goldberg Robert L.
Shipley Company Inc.
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