Positive photoresist composition with m-hydroxy-.alpha.-methylst

Details Positive photoresist composition with m-hydroxy-.alpha.-methylst Positive photoresist composition with m-hydroxy-.alpha.-methylst

1985-06-24

1987-09-29

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430190, 430193, 430326, G03C 160, G03C 1495

Patent

active

046968865

ABSTRACT:
A positive type photoresist composition comprising an m-hydroxy-.alpha.-methylstyrene polymer and as a photo-sensitizer a quinonediazide compound is disclosed. A positive type photoresist composition comprising an m-hydroxy-.alpha.-methylstyrene polymer, a novolak resin, and as a photo-sensitizer a quinonediazide compound, is also disclosed.

REFERENCES:
patent: 3402044 (1968-09-01), Steinhoff
patent: 3551154 (1970-12-01), DiBlas et al.
patent: 3869292 (1975-03-01), Peters
patent: 3902906 (1975-09-01), Iwama et al.
patent: 4139384 (1979-02-01), Iwasaki et al.
patent: 4439516 (1984-03-01), Cernigliaro et al.
Pacansky, J., IBM Technical Disclosure Bulletin, vol. 20, No. 7, 12/1977, p. 2809.

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