Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1989-11-02
1992-04-14
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430193, 430326, 430330, 430905, 430906, G03F 7023, G03F 740
Patent
active
051047683
ABSTRACT:
The invention relates to positive working photoresists for producing relief structures of high-temperature resistant polyimide prepolymers, which photoresists can be developed in aqueous-alkaline medium and which contain, in an organic solvent, essentially at least
REFERENCES:
patent: 3957512 (1976-05-01), Kleeberg et al.
patent: 4093461 (1978-06-01), Loprest et al.
patent: 4339521 (1982-07-01), Ahne et al.
patent: 4395482 (1983-07-01), Ahne et al.
patent: 4451551 (1984-05-01), Kataoka
patent: 4745045 (1988-05-01), Fredericks et al.
patent: 4880722 (1989-11-01), Moreau et al.
Bartmann Ekkehard
Sassmannshausen Jorg
Schulz Reinhard
Bowers Jr. Charles L.
Ciba-Geigy Corporation
Falber Harry
Young Christopher G.
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