Positive photoresist composition containing quinone diazide 5-tr

Details Positive photoresist composition containing quinone diazide 5-tr Positive photoresist composition containing quinone diazide 5-tr

1996-02-16

1997-09-16

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430192, 430193, G03F 7023

Patent

active

056679319

ABSTRACT:
A positive photoresist composition, including an alkali soluble novolak resin, an esterification compound represented by the following formula II as a photosensitive agent and a solvent: ##STR1## wherein R.sub.1 through R.sub.3 are independently selected from a hydrogen atom, an alkoxy group and an alkyl group containing 1 to 4 carbon atoms and are different from or the same as one another, and

REFERENCES:
patent: 4626492 (1986-12-01), Eilbeck
patent: 4889788 (1989-12-01), Stahlhofen et al.

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