Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1989-07-18
1992-06-23
Schilling, Richard L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430193, G03F 7023
Patent
active
051242281
ABSTRACT:
A quinone diazide sulfonic acid ester of a phenol compound of the general formula (I) or (II): ##STR1## wherein a, c and d are the same or different and a number of 0 to 3, provided that when a is 0 or 3, b is a number of 0 to 3 or when a is 1 or 2, b is 0, 1 or 2, and a+b and c+d are not less than 2; R and R' are the same or different and an alkyl group or an aryl group provides a positive resist composition having a high .gamma.-value.
REFERENCES:
patent: 4626492 (1986-12-01), Eilbeck
patent: 4812551 (1989-03-01), Oi et al.
patent: 4837121 (1989-06-01), Blakeney et al.
patent: 4894311 (1990-01-01), Uenishi et al.
English Language Translation of Japanese Publication #60-121445, Published Jun. 28, 1985, (Hosaka et al.).
Hanabata Makoto
Kuwana Koji
Nakanishi Hirotoshi
Oi Fumio
Uetani Yasunori
Schilling Richard L.
Sumitomo Chemical Co,. Ltd.
Young Christopher G.
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