Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1991-02-01
1992-04-21
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430190, 430192, 430193, 430326, G03F 7023, G03C 161
Patent
active
051067188
ABSTRACT:
The invention relates to positive photoresists based on alkali-soluble phenolic resin and photosensitive quinonediazide compounds which, by means of particular additives, give relief structures produced therewith an increased stability towards changes due to thermal effects.
REFERENCES:
patent: 2416773 (1947-03-01), Reichel
patent: 4093461 (1978-06-01), Loprest et al.
patent: 4668606 (1987-05-01), DoMinh et al.
patent: 4719166 (1988-01-01), Bleuins et al.
patent: 4889789 (1989-12-01), Stahlhofen
Bartmann Ekkehard
Munzel Horst
Schulz Reinhard
Bowers Jr. Charles L.
Ciba-Geigy Corporation
Villamizar JoAnn
Young Christopher G.
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