Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1996-08-07
1998-02-17
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430192, 430193, 430326, 430330, G03F 7023
Patent
active
057190046
ABSTRACT:
A light-sensitive positive photoresist composition containing a film forming novolak resin, a quinone-diazide photoactive compound, a solvent, and a 2,4-dinitro-1-naphthol dye, where the dye is present at a level greater than 0.5 weight percent of the total photoresist composition. The dye reduces the linewidth variation of the resist pattern on a reflective substrate without significantly reducing the lithographic performance of the light-sensitive composition.
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"Dissolution Rate Modifying Chemistry: Interaction of Base-soluble and Base-Insoluble Non-actinic Dyes Novolak Polymers and Novolak-Based Positive Photoresists", Cernigliaro et al, SPIE vol. 1086, 1989.
Chapter 4 of Chemistry & Application . . . , Knap et al.
Chapter 7.4 of Light Sensitive Systems, Kosar.
Dammel Ralph R.
Dixit Sunit S.
Kokinda Elaine G.
Lu Ping-Hung
Chu John S.
Clariant Finance (BVI) Limited
Jain Sangya
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