Positive photoresist composition containing 4,4-diester, 4,5-die

Details Positive photoresist composition containing 4,4-diester, 4,5-die Positive photoresist composition containing 4,4-diester, 4,5-die

1990-01-09

1991-12-24

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430192, 430193, G03C 152, G03C 156

Patent

active

050751948

ABSTRACT:
A positive photoresist composition and formulation comprising a resin matrix and a photosensitizer obtained from 1-oxo-2-diazo naphthalene-4-sulfonic acid chloride, on 1-oxo-2-diazo naphthalene-5-sulfonic acid chloride and spiroglycol to form 4,4-diester or 5,5-diester.

REFERENCES:
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patent: 3402044 (1968-09-01), Steinhoff et al.
patent: 4115128 (1978-09-01), Kita
patent: 4173470 (1979-11-01), Fahrenholtz et al.
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patent: 4550069 (1985-10-01), Pampalone
patent: 4551409 (1985-11-01), Gulla et al.
patent: 4596763 (1986-06-01), DiCarlo et al.
patent: 4737437 (1988-04-01), Gutsell et al.
patent: 4738915 (1988-04-01), Komine et al.
patent: 4883739 (1989-11-01), Sakaguchi et al.

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