Positive photoresist composition containing 4,4-diester, 4,5-die

Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...

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430165, 430192, 430193, G03C 152, G03C 156

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active

050751948

ABSTRACT:
A positive photoresist composition and formulation comprising a resin matrix and a photosensitizer obtained from 1-oxo-2-diazo naphthalene-4-sulfonic acid chloride, on 1-oxo-2-diazo naphthalene-5-sulfonic acid chloride and spiroglycol to form 4,4-diester or 5,5-diester.

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