Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1995-02-09
1997-03-18
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430191, 430192, 430193, 534557, G03F 7023
Patent
active
056121644
ABSTRACT:
A photosensitizer comprising a trishydroxyphenylethane 80/20 to 50/50 2,1,5-/2,1,4-diazonaphthoquinone sulfonate, and a trishydroxybenzophenone 0/100 to 20/80 2,1,5-/2,1,4-diazonaphthoquinone sulfate, and a photoresist composition containing such photosensitizer, the photosensitizer being present in the photoresist composition in an amount sufficient to uniformly photosensitize the photoresist composition; and a water insoluble, aqueous alkali soluble novolak resin, the novolak resin being present in the photoresist composition in an amount sufficient to form a substantially uniform photoresist composition.
REFERENCES:
patent: 4818658 (1989-04-01), Martin et al.
patent: 5290658 (1994-03-01), Uenishi et al.
patent: 5362599 (1994-11-01), Knors et al.
Canize Anthony
Ficner Stanley A.
Lu Ping-Hung
Spiess Walter
Chu John S.
Hoechst Celanese Corporation
Sayko Jr. Andrew F.
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