Positive photoresist composition

Details Positive photoresist composition Positive photoresist composition

2005-03-22

2005-03-22

Chu, John S. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

C430S191000, C430S192000, C430S193000

Reexamination Certificate

active

06869742

ABSTRACT:
A positive photoresist composition includes (A) an alkali-soluble novolak resin containing 1,2-naphthoquinonediazidosulfonyl groups substituting for part of hydrogen atoms of phenolic hydroxyl groups, (B) an ester of, for example, a compound represented by the following formula with a naphthoquinonediazidosulfonyl compound, and (C) a sensitizer:

REFERENCES:
patent: 5238775 (1993-08-01), Kajita et al.
patent: 5380618 (1995-01-01), Kokubo et al.
patent: 5413896 (1995-05-01), Kajita et al.
patent: 5422221 (1995-06-01), Okazaki et al.
patent: 5478691 (1995-12-01), Miyashita et al.
patent: 5529880 (1996-06-01), Zampini et al.
patent: 5639587 (1997-06-01), Sato et al.
patent: 5695906 (1997-12-01), Nishi et al.
patent: 5723254 (1998-03-01), Zampini et al.
patent: 5728504 (1998-03-01), Hosoda et al.
patent: 5932389 (1999-08-01), Zampini
patent: 6210855 (2001-04-01), Ueda et al.
patent: 6391513 (2002-05-01), Susukida et al.
patent: 10-069077 (1998-03-01), None
patent: 11-015151 (1999-01-01), None

Affiliated with

Also associated with

Rating

Positive photoresist composition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Positive photoresist composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive photoresist composition will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3424259