Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1996-05-21
1997-09-16
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430191, 430193, G03F 7023
Patent
active
056679327
ABSTRACT:
Disclosed is a positive photoresist composition comprising an alkali-soluble resin and 1,2-naphthoquinonediazide-5-(and/or -4-)sulfonic esters of a polyhydroxy compound having a particular structure consisting of 5 aromatic rings linked linearly, in which each of the aromatic rings contains a hydroxyl group and the respective aromatic rings next to both the terminal rings contains a substituent group at the 5-position to the hydroxyl group thereof. The positive photoresist composition which has high resolution, low dependence of the resolution on film thickness, and broad latitude of development, leaves little development residue, and has very excellent storage stability without separation of photosensitive materials and generation of microgel (no increase in particle) with a lapse of time.
REFERENCES:
patent: 5407779 (1995-04-01), Uetani et al.
patent: 5494773 (1996-02-01), Tan et al.
patent: 5514515 (1996-05-01), Zampini et al.
patent: 5534382 (1996-07-01), Kawabe et al.
Kodama Kunihiko
Momota Makoto
Sato Kenichiro
Chu John S.
Fuji Photo Film Co. , Ltd.
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