Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1997-01-30
1997-12-30
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430192, 430193, G03F 7023
Patent
active
057028613
ABSTRACT:
A positive photoresist composition comprising: (A) an alkali-soluble resin; (B) a quinone diazide group-containing compound; and (C) at least one compound selected from the polyhydroxy compounds, such as composition of the present invention exhibits excellent image contrast between exposed portions and unexposed portions, and actualizes formation of a resist pattern with excellent resolution, exposure range, and focal depth range.
REFERENCES:
patent: 5112719 (1992-05-01), Yamada et al.
patent: 5407778 (1995-04-01), Uetani et al.
patent: 5456995 (1995-10-01), Ozaki et al.
patent: 5456996 (1995-10-01), Ozaki et al.
patent: 5478692 (1995-12-01), Doi et al.
patent: 5501936 (1996-03-01), Hosoda et al.
patent: 5529881 (1996-06-01), Kawabe et al.
patent: 5534382 (1996-07-01), Kawabe et al.
patent: 5601961 (1997-02-01), Nakayama et al.
Doi Kousuke
Kohara Hidekatsu
Nakayama Toshimasa
Niikura Satoshi
Suzuki Takako
Chu John S.
Tokyo Ohka Kogyo Co. Ltd.
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