Positive photoresist composition

Details Positive photoresist composition Positive photoresist composition

1987-03-09

1989-08-22

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430193, 430326, 528153, 528155, 534557, G03C 154, G03C 160

Patent

active

048595632

ABSTRACT:
Disclosed herein is a positive photoresist composition containing (a) a photosensitizer of 1,2-napthtoquinone diazides photosensitive-material comprising an ester of 2,3,4,4'-tetrahydroxybenzophenone in which on the average, not less than two hydroxyl groups of 2,3,4,4'-tetrahydroxybenzophenone have been esterified by 1,2-naphthoquinonediazide-5-sulfonic acid and (b) a novolak resin obtained by condensing a mixture of m-cresol, p-cresol and 2,5-xylenol with formaldehyde.

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English translation of Japanese Publication #60-164,740, Published 8/27/1985.

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