Positive photoresist composition

Details Positive photoresist composition Positive photoresist composition

1990-06-29

1992-09-08

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430190, 430191, 430192, 430193, G03C 154, G03F 7022

Patent

active

051457636

ABSTRACT:
A positive photoresist composition containing (i) a quinone diazide polymer formed by reacting a cresol-formaldehyde novolac resin and an o-quinonediazide compound, and (ii) a sulfonamide development enhancement agent.

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Research Disclosure No. 242, Jun. 1984, Havant GB p. 240.

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