Positive novolak photoresist compositions

Details Positive novolak photoresist compositions Positive novolak photoresist compositions

1981-06-22

1983-03-22

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430191, 430326, 430311, 430323, 430330, G03C 154, G03C 160

Patent

active

043776310

ABSTRACT:
Fast positive photoresist compositions employing cresol-formaldehyde novolak resins made from a mixture containing meta- and paracresol or ortho-, meta- and paracresol in a ratio selected from a given range and one or more of a selected group of naphthoquinone diazide sensitizing compounds. When dissolved in a mixture of organic solvents, the photoresist compositions are suitable for application as a thin coating to a substrate. After the coating has been dried, the coated substrate can be exposed to image-wise modulated actinic radiation even in the deep ultra-violet range and developed in alkaline solution, yielding a high-resolution relief pattern of resist on substrate useful for a number of applications.

REFERENCES:
patent: 3130048 (1964-04-01), Fritz et al.
patent: 3647443 (1972-03-01), Rauner et al.
patent: 3666473 (1972-05-01), Colom et al.
patent: 4173470 (1979-11-01), Fahrenholtz et al.
patent: 4211834 (1980-07-01), Lapadula et al.

Affiliated with

Also associated with

Rating

Positive novolak photoresist compositions does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Positive novolak photoresist compositions, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive novolak photoresist compositions will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1869622