Positive electron beam resists of ortho chloro substituted pheno

Details Positive electron beam resists of ortho chloro substituted pheno Positive electron beam resists of ortho chloro substituted pheno

1981-08-31

1983-04-12

Schilling, Richard L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

430192, 430296, 430326, 20415914, 525480, G03C 158, G03C 522, G03C 534, G03C 500

Patent

active

043798268

ABSTRACT:
The sensitivity of a positive working electron beam resist is increased by using as the resist material a resin which is a condensation product of formaldehyde with a phenol or a cresol having a chloro substituent ortho to the hydroxyl group on its aromatic ring.

REFERENCES:
patent: 3728293 (1973-04-01), Booth et al.
patent: 3802885 (1974-04-01), Lawson et al.
patent: 4123279 (1978-10-01), Kobayashi
patent: 4211834 (1980-07-01), Lapadula et al.
"Negative Photosensitive Materials," Lavreshchev et al., Chem. Abst. 70 53023m.

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