Positive electrode of an electric double layer capacitor

Electricity: electrical systems and devices – Electrolytic systems or devices – Double layer electrolytic capacitor

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C361S503000, C361S508000

Reexamination Certificate

active

07006346

ABSTRACT:
Provided in the present invention is a positive electrode for use in an Electric Double Layer (EDL) Hybrid Electrochemical Capacitor (HEC). Embodiments of the invention can be further adapted produce an EDL HEC with a high specific energy value and a high maximum voltage value. Some aspects of an embodiment of the present invention, including the aforementioned positive electrode, also cooperate to provide an EDL HEC that has a relatively high cycleability.

REFERENCES:
patent: 4313084 (1982-01-01), Hosokawa et al.
patent: 4562511 (1985-12-01), Nishino et al.
patent: 4888666 (1989-12-01), Naitoh et al.
patent: 5949637 (1999-09-01), Iwaida et al.
patent: 6115235 (2000-09-01), Naito
patent: 6195252 (2001-02-01), Belyakov et al.
patent: 6426862 (2002-07-01), Vasechkin et al.
patent: 6466429 (2002-10-01), Volfkovich et al.
patent: 6628504 (2003-09-01), Volfkovich et al.
patent: 2005/0034507 (2005-02-01), Volfovich et al.
patent: 2-11008 (1990-01-01), None
patent: WO97/05718 (1997-02-01), None
Volfkovich, Y., M. and Bagotsky, V.S., “The Method of Standard Porosimerty,”J. Power Sources48:327-339 (1994).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Positive electrode of an electric double layer capacitor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Positive electrode of an electric double layer capacitor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive electrode of an electric double layer capacitor will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3675531

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.